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LPP News
Extreme UV Sources Fill the Gap
Mar 28, 2018 — The electromagnetic spectrum has several regions where emitters, detectors, or both are not readily available. Terahertz and the far-infrared are prime examples. Even within the visible spectrum, much has been said about the “green gap” — the wavelength region between 500 and 600 nm where efficient and high-brightness solid-state sources were, until recently, hard to come by (Figure 1). Figure 1. An LDLS (laser-driven light source) module from Energetiq Technology Inc.,
Gigaphoton Develops Helium-Free Laser Purge Process
OYAMA, Japan, June 30, 2014 — Gigaphoton recently announced two advancements for lithography lasers: a helium-free purge process and a high-power laser prototype. The helium-free purge process for argon-fluorine (ArF) immersion lasers uses nitrogen, an abundant gas the company...
Gigaphoton, Mitsubishi Develop CO
2
Drive Laser
OYAMA, Japan, Oct. 1, 2013 — Lithography light source manufacturer Gigaphoton Inc. has developed a high-power CO2 drive laser for extreme-ultraviolet (EUV) light sources with Mitsubishi Electric Corp., the company announced Monday. The laser demonstrated an average output level...
Gigaphoton reports 2-h-straight run for EUV source
Sep 1, 2013 — Gigaphoton Inc.’s extreme UV (EUV) laser-produced plasma (LPP) light source has achieved 2-h continuous operation. The milestone was confirmed using a prototype LPP system that generates EUV light by irradiating tin droplets with a solid-state...
Gigaphoton Reports 2-h-Straight Run for EUV Source
OYAMA, Japan, July 2, 2013 — Lithography light source manufacturer Gigaphoton Inc. has announced that its extreme UV (EUV) laser-produced plasma (LPP) light source has achieved 2-h continuous operation.
Gigaphoton Confirms Debris Mitigation Technology
Sep 1, 2011 — Based in Oyama, Japan, Gigaphoton Inc., a lithography light source manufacturer, has confirmed its original technology for mitigating debris with magnetic fields for laser-produced plasma (LPP) light sources. It plans to push forward with a...
Plasma Source Enables High-Volume Manufacturing with EUV Lithography
Sep 1, 2011 — As the lithography capital equipment sector moves toward early field deployment of extreme-ultraviolet (EUV) scanners and support, the 13.5-nm EUV energy source continues to be a key factor in the ultimate adoption and economic success of the...
Gigaphoton Confirms Debris Mitigation Technology
OYAMA, Japan, July 14, 2011 — Gigaphoton Inc., a lithography light source manufacturer, announced that it has confirmed its original technology for mitigating debris with magnetic fields for laser-produced plasma (LPP) light sources. It plans to push forward with a...
104 W EUV Light Source Output Achieved
OYAMA, Japan, May 4, 2010 — Gigaphoton Inc., a lithography light source manufacturer, announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved 104 W — the...
Moving EUVL From Lab to Fab
MAUI, Hawaii, June 3, 2008 -- More than 100 leading lithographers will meet in Maui next week to begin developing a plan to speed the introduction of extreme ultraviolet lithography (EUVL) into high-volume semiconductor manufacturing. The effort will take place June 10-12 at...
Moving EUVL From Lab to Fab
MAUI, Hawaii, June 3, 2008 -- More than 100 leading lithographers will meet in Maui next week to begin developing a plan to speed the introduction of extreme ultraviolet lithography (EUVL) into high-volume semiconductor manufacturing. The effort will take place June 10-12 at...
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April 2024
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