Yale Selects Vistec Litho System
WATERVLIET, N.Y., March 8, 2010 – Vistec Lithography Inc. announced that Yale University of New Haven, Conn., selected its EBPG5000plus electron-beam lithography system for its future nanotechnology research programs.
The system, as part of the Yale Institute for Nanoscience and Quantum Engineering, will enhance the effectiveness of research and education at the university in emerging nanotechnology and will encourage multidisciplinary research involving the faculty, students and associated worldwide research partners....