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Analysis of Metallic Impurities in Organic Solvents Used in IC Fabrication With ICP-MS

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Author: Kyoko Kobayashi and Ewa Pruszkowski
Thursday, February 4, 2021

Even though Integrated Circuit (IC) fabrication takes place inside the highly controlled cleanroom environment, contaminants from process chemicals, such as Isopropyl alcohol, account for over 50% of Integrated Circuits' production losses. Chemical producers continually strive to deliver organic solvents with lower levels of contaminants. In this application note, we look at the analyses of 46 elements in three different solvents.

File: NexION_5000_ICP_MS.pdf (1.66 MB)
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Materials & Chemicalssemiconductorsmetallic impuritiesorganic solventsintegrated circuits
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