Request InfoPlasma Etch Inc.CARSON CITY, Nev., Oct. 12, 2011 — Plasma Etch has introduced a plasma system that incorporates two individual plasma etching/cleaning-type-mode technologies into one complete stand-alone plasma etching/cleaning system. The PE-100 Convertible allows the user to switch back and forth between reactive ion etch anisotropic type etching mode applications and isotropic-type etching/cleaning mode applications. Traditionally, two separate stand-alone plasma systems were necessary to achieve this. The system is suitable for use in research and development, medical devices, solar cells, optics, printed circuit boards,...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 6/13/2023Linear Voice Coil MotorThe HVCM-051-032-013-01 Linear Voice Coil Motor from Moticont features a high force-to-size ratio and a 19.1-mm stroke. 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