Request InfoRudolph Technologies Inc.Expert application system (Easy) software released by Rudolph Technologies Inc. enhances the capabilities of the company's MetaPulse and MetaPulse-II opaque film metrology line to cover 90-nm chip manufacturing processes. The software is suitable for applications including in-line electroplate edge profiling, residual copper/barrier detection after chemical mechanical planarization, and copper/interlevel dielectric dishing. 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