Request InfoCymer Inc.Operating at a maximum repetition rate of 4 kHz and delivering up to 60 W of output power, Cymer Inc.'s XLA 200 excimer light source is designed for immersion lithography applications. The third-generation master-oscillator-power-amplifier-based ArF light source is engineered for the volume production of semiconductors at the 45-nm node. Bandwidth is ≤0.12 pm FWHM and ≤0.25 pm at 95% energy integral.See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 3/21/2024Probe MicroscopeThe INX™ 760 from VIAVI is a single, duplex, and multi-fiber probe microscope for reducing time in the construction, activation, and maintenance of complex fiber networks. Utilizing an...Photonics.com 7/13/2023Femtosecond LaserThe Monaco 345-25-50 industrial UV femtosecond laser from Coherent Corp. features 50 W of output power. 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