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lithography News
Chemically assembled metamaterials pave way for superlenses
ITHACA, N.Y. – A new metamaterial can self-assemble 3-D structures with nanoscale features, a feat that could make “superlenses” to image proteins, DNA and viruses. Metamaterials offer new ways to manipulate light via negative refractive indices and typically are made with common deposition and lithography techniques such as electron beam lithography or atomic sputtering. But these techniques can only create materials in thin layers. The new method, proposed by Cornell University researchers...
Gigaphoton Reaches Milestone
OYAMA, Japan, Dec. 15, 2011 — Lithography light source manufacturer Gigaphoton Inc. has shipped its 1000th excimer laser for semiconductor photolithography. Komatsu, Gigaphoton’s predecessor, marketed Japan’s first excimer laser in 1985, followed by the world’s...
Smarter Way to Make UV Beams
ANN ARBOR, Mich., Nov. 30, 2011 — A better way to build compact ultraviolet (UV) light sources with low power consumption has been discovered using an optimized optical resonator, which could lead to improved information storage, microscopy and chemical analysis. Researchers...
Metamaterials Pave Way for Superlens
ITHACA, N.Y., Nov. 11, 2011 — Casting tiny, oddly shaped metal structures inside plastic molds could give a boost to creating metamaterials for making “superlenses” that can image proteins, viruses and DNA. Metamaterials, which offer new ways to manipulate...
Organic electronics printed on CDs, DVDs
LOS ANGELES – A new patterning technique uses commercially available technology to print conducting polymers using an infrared laser onto standard CDs and DVDs, a feat that could propel current proof-of-concept organic devices – organic LEDs, thin-film...
Globalfoundries Vet Wurm Named Lithography Director at Sematech
ALBANY, N.Y., Oct. 4, 2011 — Dr. Stefan Wurm was named Sematech’s director of lithography, the company announced. Wurm is a veteran of Globalfoundries, based in Milpitas, Calif., and has more than 20 years of experience in industry and R&D. Wurm will be...
Plasma Source Enables High-Volume Manufacturing with EUV Lithography
Sep 1, 2011 — As the lithography capital equipment sector moves toward early field deployment of extreme-ultraviolet (EUV) scanners and support, the 13.5-nm EUV energy source continues to be a key factor in the ultimate adoption and economic success of the...
Ophir-Spiricon Opens New Cleanroom
LOGAN, Utah, June 28, 2011 — Ophir-Spiricon, a member of the precision laser measurement equipment provider Ophir Photonics Group, has opened a cleanroom at its new facility in Logan. The 840-sq-ft cleanroom is used for manufacturing the solid-state, pyroelectric detector...
J-fiber Utilizes Schott Technology
Jun 1, 2011 — The acquisition of Schott Lithotec’s fused-silica technology last fall has enabled 7375%%j-fiber Group to provide optics and laser markets with high-purity synthetic silica. The transaction involved the transfer of processes, people and...
Sophisticated Software Allows Complex Optical Design
Jun 1, 2011 — Software has pushed the optics and photonics fields forward in myriad ways, sometimes with profound effects on business and culture. Would we have been able to take full advantage of the many technology advances in the past five decades –...
The RAPID way to next-gen computer chips
COLLEGE PARK, Md. – At the University of Maryland, scientists have achieved a breakthrough in using visible light to make tiny integrated circuits. Although the technology may not become commercially available for more than a decade, it may eventually make it possible...
J-fiber Buys Fused Silica Tech from Schott Lithotec
JENA, Germany, March 8, 2011 — As a result of its recent acquisition of Schott Lithotec’s synthetic fused silica technology, the j-fiber Group can provide optics and laser markets with high-purity synthetic silica. The fall 2010 transaction involved the transfer of...
Group to Develop Stroke Sensor
MONS, Belgium, Jan. 14, 2011 — The P3SENS consortium has been formed to develop an immunoassay detection device suitable for emergency stroke diagnosis. Co-funded by the Seventh EU Framework Program, the €3.6 million project will develop photonic crystal technology for...
Suss MicroTec Collaborates with Cornell
GARCHING, Germany, Jan. 13, 2011 — Suss MicroTec, a process solutions company for the semiconductor industry and related markets, announced a strategic collaboration with the Cornell NanoScale Science & Technology Facility (CNF), a university nanofab based in North America. As...
Dutch Photonics Strives for Smaller, Faster and Cheaper
Dec 1, 2010 — Located in North-West Europe and bordering the North Sea, Belgium and Germany, the Netherlands is well positioned as a key trading center. It has excellent transport links, including Schiphol Airport in Amsterdam, recognized as one of the major hubs...
High-Precision Wafer-Level Optics Fabrication and Integration
Dec 1, 2010 — The evolution of micro-optical components for camera modules is today being strongly driven by the mobile phone industry, while manufacturers of conventional camera modules – which are assembled from a multitude of individual parts – are...
Lithography System Order
Dec 1, 2010 — Vistec Lithography Inc. of Watervliet, N.Y., has announced that AMO GmbH of Aachen, Germany, a nanotechnology research service provider, has placed an order for its EBPG5200 electron beam lithography system. The instrument can generate structures...
Zygo EPO Group Receives $5M in Orders
MIDDLEFIELD, Conn., Nov. 29, 2010 — Zygo Corp., supplier of optical metrology instruments and high-precision optical systems, announced that its newly formed Extreme Precision Optics (EPO) Group in Richmond, Calif., received initial orders totaling $5.1 million from a major...
Carl Zeiss, Synopsys Collaborate on Photomask Manufacturing
JENA, Germany and MOUNTAIN VIEW, Calif., Nov. 5, 2010 — Carl Zeiss SMS GmbH and Synopsys Inc. announced a collaboration to support the Zeiss tool family for in-die metrology solutions for the 32-nm technology node and below. Under the terms of the agreement, Synopsys will offer support for Zeiss’...
Synopsys Acquires Optical Research Associates
MOUNTAIN VIEW, Calif., Oct. 7 — Electronic design automation provider Synopsys Inc. announced Thursday that it has extended its engineering software capability into optical design and analysis by acquiring privately held Optical Research Associates (ORA) of Pasadena, Calif., for...
Arbor Photonics Wins Fiber Laser Funding
ANN ARBOR, Mich., Sept. 23, 2010 — Fiber laser solutions provider Arbor Photonics Inc. has received SBIR Phase IB funding from the National Science Foundation for its work on “High Power Pulsed Fiber Lasers for EUV Lithography.” The supplemental award will support...
Metrology System Advances Photomasks
JENA, Germany, Aug. 16, 2010 — Sematech and the Semiconductor Metrology Systems (SMS) division of Carl Zeiss announced recently that Zeiss’ next-generation photomask registration and overlay metrology system has passed a key development milestone. The jointly developed...
Lithography System Order
Aug 1, 2010 — Pennsylvania State University of University Park has ordered Vistec Lithography Inc.’s EBPG5200 electron-beam lithography system for the National Science Foundation’s National Nanotechnology Infrastructure Network so as to support...
To Step Up, Semiconductor Lithography Steps Down – Way Down
Aug 1, 2010 — For semiconductors, smaller is better. That’s why the industry may soon take a big step down. On the horizon is a switch from 193- to 13.5-nm-wavelength lithography. This extreme-ultraviolet (EUV) technology eventually could allow an almost...
EVG Unveils New Wafer Bonder
ST. FLORIAN, Austria, July 27, 2010 — EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, announced that it has introduced the EVG560HBL wafer bonder. According to the company, it’s the industry’s...
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June 2024
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