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TEL News
Integrated Fabrication Process Demonstrated for Metal-Oxide EUV Photoresist
LEUVEN, Belgium, March 8, 2016 — The first integrated patterning process for next generation high-resolution devices using a nonchemically amplified metal containing photoresist and EUV lithography has been presented by nanoelectronics research center imec along with EUV...
Edwards, TEL Announce Joint Development Agreement
Nov 25, 2008 — Edwards, located in Crawley, West Sussex, UK, has announced that it will jointly develop a perfluorocarbon (PFC) gas abatement system with Tokyo Electron Ltd (TEL) – the PA-01E for etch equipment. The new gas abatement system will be available...
Jerry Coder Appointed SEMI Chairman
Jul 20, 2007 — SEMI announced the appointment of Jerry Coder, president emeritus of the semiconductor materials business unit of Dupont Electronic Technologies, as chairman of the industry association's international board of directors. Coder, a 40-year veteran of...
News Briefs
Dec 7, 2005 — Spire Corp. was awarded a $750,000 Phase II Small Business Innovative Research (SBIR) project from the Department of Homeland Security Advanced Research Projects Agency to develop a terahertz-based standoff detection imager. The imager will emit...
(4 results found)
April 2024
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