A technique used in photolithography of computer chips to compensate for errors caused by the proximity effect, which results in variations in size between areas of the mask that have many small openings and areas that have isolated openings. The...

Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the...

An electron-gun system is an assembly used to generate and control a focused beam of electrons. Electron guns find...

The underexposure caused by the diffraction of light passing through small openings spaced closely together in masks used in...

Micro-optics refers to the design, fabrication, and application of optical components and systems at a microscale level....

Photonic crystals are artificial structures or materials designed to manipulate and control the flow of light in a manner...

A beam shaper is an optical device or system designed to modify the spatial profile or intensity distribution of a laser or...

Photoresist is a light-sensitive material used in photolithography processes, particularly in the fabrication of...

A method of creating real three-dimensional models by using lasers driven by CAD software. In contrast to the normal...

Deep ultraviolet (DUV or deep-UV) refers to a specific range of ultraviolet light with shorter wavelengths than those in the...

An artificial material, engineered to have a negative refractive index value, such that light or any other form of...

In the context of thin film deposition processes such as evaporation or sputtering, masks are used to selectively deposit...

In photonics, a lattice refers to a periodic arrangement of optical elements or structures, often on a microscopic or...

An electron-beam lithography (EBL) system is a sophisticated nanofabrication tool used in the semiconductor industry and...

In photolithography, an opaque material used in masks that has a lower optical density and grainier composition than chrome.

Nanopositioning refers to the precise and controlled movement or manipulation of objects or components at the nanometer...

An excimer laser is a type of ultraviolet laser that emits short pulses of light in the ultraviolet spectrum. The term...

A technique for producing micron-size structures on surfaces by using short-wavelength light or electron beams.

Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum....

Nanoimprint lithography (NIL) is a nanolithography technique used for fabricating nanoscale patterns on a substrate. It is a...

A lithography method that allows the transfer of fine-pitch gratings from a phase mask into photoresist. The exposure takes...

1. A framelike structure that serves to restrict the viewing area of the screen when placed before a television picture...

An advanced magnetic device used in x-ray lithography to beam x-rays onto the surface of silicon wafers used for...

In optics and photolithography, a phase mask refers to a device that modifies the phase of light waves passing through it....

Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and...

Fused quartz and silica are closely related materials, both composed primarily of silicon dioxide (SiO2), but they are...

A method of projecting integrated circuit patterns on a silicon wafer using x-ray wavelengths focused through a special mask.

In the context of electronics and semiconductor manufacturing, a wafer refers to a thin, flat disk or substrate made of a...

A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in...

Additive manufacturing (AM), also known as 3D printing, is a manufacturing process that involves creating three-dimensional...

Optical elements, often created by micromachining, lithography or vacuum deposition, that rely on diffraction of the...