Leica Microsystems AG, Microscopy Div.New software from Leica Microsystems AG has extended the capabilities of the company's INS3300 modular inspection and review station for applications such as direct-write lithography and process control of 300- and 200-mm wafers. SpotCheck automates inspection of critical sites on wafers for process irregularities and for system defects, such as overlay shift and those already on the reticle or mask. It detects particles, extra pattern and probe mark position errors. The company says that when used with its optional ADC NT/DUV software, the device can classify defects automatically, quickly...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 3/21/2024Retimed 800G TransceiversLessengers’ portfolio of partially retimed 800G optical transceivers are designed for AI/ML workloads in hyperscale data centers. 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